You are cordially invited to attend the 14th Symposium of Application of Plasma Processes (SAPP XIV), which will be held in  the JAMAJKA Hotel Bobrovnik, The Low Tatras, Slovakia.

General information:

The SAPP XIV is a biennial international conference, the last having been held in Tale, in 2001. Topics range from the basic physics and chemistry of thermal and low pressure plasmas to industrial processes and processing techniques. The conference should enable the exchange of information and ideas between basic/applied researches and industrial practitioners.


ˇ         electrical discharges and other sources of low temperature plasma

ˇ         elementary processes and chemical reactions in low temperature plasma

ˇ         plasma enhanced deposition processes

ˇ         plasma-surface interactions

ˇ         properties of thin films and interfaces prepared with assistance of plasma

ˇ         application of plasma sources in technology, plasma treatment

ˇ         plasma synthesis, plasma spraying, plasma metallurgy

ˇ         plasma in industrial production of thin film solar cells, renewable energy sources

ˇ         environmental applications


The Conference programme will include invited (40 minutes), contributed (15 minutes) talks, and poster presentations. Contributions will be published in the Conference proceedings and also in non-shortened version in special issue of Acta Physica Slovaca (February 2003), dealt by Current Contents database, recognized by European Physical Society and indexed in Physics Abstracts.

Social programme:

A number of social events will be organized for conference participants and their guests. The programme will include every day skiing. There will be a variety of other possibilities such as excursions and sightseeing tours.


The Symposium language will be English.  

Organizing Committee:

Emil Pinčík, Institute of Physics SAS (chairman)

Miroslav Zahoran, Comenius University (co-chair)

Pavol Šutta, Military Academy (co-chair)

Róbert Brunner, Institute of Physics SAS

Jarmila Müllerová, Military Academy

Anna Zahoranová, Comenius University

Radovan Mičunek, Comenius University

Mária Zubeková, Institute of Physics SAS


Scientific committee:

Peter Lukáč (chairman)

Tilmann Märk

Eva Majková

Pavol Šutta

Jerzy Mizeraczyk 

Eugen Illenberger


Preliminary list of invited speakers

  K. Becker, Univ. New York, New York, USA:

Physics and applications of atmospheric-pressure discharge plasmas .

 D. Bohme, York University, Toronto, Canada:

Studies of the oxidaton of atomic metal ions in the gas phase.

 M. Černák, Institute of Physics, Comenius University, Bratislava, Slovakia:

     Atmospheric-pressure plasma treatment of fabrics.

  M.A. Djouadi, Laboratoire des Plasmas et des Couches Minces, Nantes, France:

     Deposition of boron nitride films by PVD methods: transition from h-BN to c-BN.

 R. Flannery, Univ. Atlanta, USA:

 Recombination at ultra low energies and the formation of anti-hydrogen .

 Z. Herman, J. Heyrovsky Institute of Physical Chemiistry AS CR Praha, Czech Republic:

Dynamics of chemical and charge transfer reactions of molecular dications.

 J. Janča, Masaryk University, Brno, Czech Republic:

ESR in the diagnostics of plasma afterglow. 

 H. Kersten, University of Greifswald, Greifswald, Germany:

Complex (dusty) plasmas: trends in applications and diagnostics.

 W.M.M. Kessels, Eindhoven University of Technology, Eindhoven, The Netherlands:

Growth mechanism of plasma deposited films.

 F. Le Normand, IPCMS, UMR 7504 CNRS, Strasbourg, France:

Recent advances in the controlled nucleation and growth of CVD diamond.

 T. Makabe, Keio University, Yokohama, Japan:

  Topdown plasma nano-processing: Velocity distribution of positive and negative ions incident on a wafer for SiO2 etching in a two-frequency capacitively coupled plasma in CF4/Ar.

 N. Mason, University College London, London, U.K.:

Electron driven processes in low temperature plasmas.

 T. Märk, Institut für Ionenphysik, Innsbruck, Austria:

Energetics and mechanisms of ion-surcafe reactions of relevance to plasma wall interaction.

 G. Musa, Ovidius University, Constanta, Romania:

Thermionic vacuum arc high quality thin film deposition technology.

  G. Popa, Al. J. Cuza University, Iasi, Romania:

 Biomaterials and plasma treatments.

 B.M. Smirnov, Moscow, Russia:

 Processes with atomic ions in gases.

 P. Šunka, Institute of Plasma Physics of AS CR, Prague, Czech Republic:

      Potential applications of pulse electrical dischrges in water .

L. Zajíčková, Masaryk University, Brno, Czech Republik:  

     Study of plasma treatment of polycarbonate substrate and its
  effect on film deposition.

Prof. Dr. Francesco Pontiga, Universidad de Sevilla, Sevilla, Spain:

      Physico-chemical modelling of negative corona in oxygen: ozone generation.

J. Mizeraczyk, Gdańsk, Poland

      Electrohydrodynamical effect in non-thermal plasma reactors.

Call for papers:

Maximum length of extended abstracts (including figures and references):

4 pages for invited lectures

2 pages for contributed papers.


Proceedings available at the registration. For submission to Acta Physica Slovaca file document written in LaTeX  or MS Word  is required.  

Symposium is organized by:

ˇ         Institute of Physics of Slovak Academy of Sciences, Bratislava

ˇ         Department of Plasma Physics & Institute of Physics at Comenius University, Bratislava

ˇ         Department of Physics, Faculty of Logistics of Military Academy, Liptovský Mikuláš

ˇ         Union of Slovak Mathematicians and Physicists, Slovakia  

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