1. L. Aubrecht, J. Koller, L. Seidelmann: Polymer films modification by atmospheric corona discharge.
2. L. Seidelmann, L. Aubrecht: New discharge tube with virtual cathode.
3. P. Baroch, J. Musil, T. Tölg and J. Vlček: Pulsed DC dual magnetron with a gas injection inside discharge and tilted sputtering.
4. Wiesława Barszczewska, Iwona Szamrej and Mieczysław Foryś: Low energy electron attachment in halocarbons.
5. M. Bartlová, J. Bartl, O. Coufal: Unimolecular reactions in chemical kinetics of SF6-arc plasma.
6. M. Bartlová: Kinetic modelling in SF6 arc plasmas.
7. L. Moskwinski, P.J. Ricatto, S. Babky-Malyi, R. Crowe, N. Abramzon, C. Christodoulatos, K. Becker, G. Korfiatis: Investigation of a novel capillary non-thermal, ambient-pressure plasma for cleaning aluminum surfaces.
8. A. Koutsospyros, Shu Yi Min, C. Christodoulatos, K. Becker, and G. Korfiatis: Destruction of environmental air contaminants in advanced life support systems using a non-thermal, ambient-pressure plasma.
9. J.Benedikt, R.V.Woen, S.L.M.v.Mensfoort, V.Perina, M.C.M.v.d.Sanden: Detailed investigation of the plasma chemistry in Ar/C2H2 expanding thermal plasma and its influence on the film properties.
10. B. Bienkowska, S. Jednorog, I.M. Ivanova-Stanik, M. Scholz: Application of the ion beam emitted from plasma focus device for target activation.
11. A. Brablec, D. Trunec: Deposition of thin films by atmospheric pressure glow discharge burning in nitrogen.
12. P. Slavíček, A. Brablec, V. Kapička, M. Klíma, M. Šíra: Longitudinal emission diagnostics of plasma channel in RF barrier torch discharge.
13. D. Trunec, P. Sťahel, P. Slavíček and A. Brablec: The different types of dielectric barrier discharge in gas mixtures.
14. V. Buršíková, P. Dvořák, L. Zajíčková, P. Klapetek, J. Buršík, and J. Janča: Effect of the discharge conditions on the mechanical properties of the plasma deposited DLC: SiOx films.
15. P. Cicman, K. Gluch, A. Pelc, W. Sailer, Š. Matejčík, M Francis, W. Robertson, R.N. Compton, P. Scheier and T.D. Märk: Electron impact ionisation to CHF2Cl.
16. R.Daniel and J.Musil: Structure and mechanical properties of magnetron sputtered Zr-Ti-Cu-N films.
17. M. Eliáš, J. Janča, J. Žila, V. Brožek: Optical diagnostics of ICP discharge during synthesis of tungsten carbide.
18. J. Fedor, R. Parajuli, K. Głuch, S. Matt-Leubner, A. Stamatovic, M. Probst, P. Scheier and T.D. Märk: Metastable decay of Rg2+ (Rg = Ne, Ar, Kr, Xe): mechanisms, dynamics and energetics.
19. L. Feketeova, A. Qayyum, T. Tepnual, C. Mair, W. Schustereder, Z.Herman , P. Scheier and T.D. Märk: Influence of the charge state and of the internal energy of the projectile on the observed fragmentation patterns in ion/surface collisions.
20. J. Ferdinand: Probe diagnostics in the plasma-chemical processes.
21. D. Franta: New dispersion model of the optical constants of the DLS films.
22. Z. Frgala: Depsition of hard carbon films and its diagnostics.
23. E. Lozneanu, D. Dimitriu, C. Găman, C. Furtuna, E. Filep, M. Sanduloviciu: Self-organization as the cause of different states of DC and HF discharge plasmas.
24. D. G. Dimitriu, C. Găman, M. Mihai-Plugaru, G. Amarandei, C. Ioniţă, E. Lozneanu, M. Sanduloviciu, R. Schrittwieser: Simple experimental methods to control chaos in a DP machine plasma.
25. C. Găman, D. Dimitriu, M. Plugaru, E. Lozneanu, C. Ioniţă and M. Sanduloviciu: The anode glow of a DC gas discharge as an illustrative example of a cas-cading scenario of self-organization.
26. C. Gherman, C. Borcia, E. Lozneanu, M. Sanduloviciu, and C. Găman: Phenomena observed in laboratory plasmas relevant for so-called anomalous transport observed in plasma devices.
27. J. Horacek: Calculation of rate constants for dissociative attachment of low-energy electrons to hydrogen halides HCl, HBr and HI and their deuterated analogs.
28. M. Ivanova-Stanik, L. Karpinski, M. Scholz: Influence of the insulator parameters on discharge in small plasma focus device.
29. M. Jaššo: Surface modification of reinforcing materials by polar substance initiated by low-temperature plasma.
30. T. Khayamian, M. Tabrizchi: Application of corona discharge ion mobility spectrometry for the determination of some organic pollutants.
31. J. Koller: Pulse properties of corona discharge.
32. J. Kopyra, J. Wnorowska, I. Szamrej: Low energy electron interaction with some chloroethanes.
33. H. Hajduchová, F. Krčma: Features of simul-software for numerical simulation of optical spectra of diatomic moleculs.
34. Z. Stará, F. Krčma: The investigation of the DC diafragm discharge in liquids.
35. Z. Rašková, H. Hajduchová, I. Havelková, F. Krčma, J. Vaněk, R. Přikryl, V. Čech: Spectroscopic observation of plasma deposition of the thin silane and siloxane based films.
36. J. Pryčková, V. Buršíková: Estimation of the surface free energy of diamond-like carbon films.
37. A. Mackova, V. Perina, V. Hnatowicz, Z. Stryhal, J Pavlik, A.Quédé, P. Supiot, G. Borvon, A. Granier, P. Raynaud:
The combined study of the HMSDO layers by RBS, ERDA and AFM analytical methods obtained from PECVD and
PACVD
38. A. Kolouch, J. Hladík, P. Spatenka: Influence of different type of plasma sources on a surface treatment of polymers.
1. V. Kudrle, A. Tálský, M. Urbánek: Increase of dissociation degree in afterglow due to admixtures.
2. V. Kudrle: Organosilicone reactions with atoms.
3. J. Leština, J. Musil: Electrical resistivity of Cu films sputtered by pulsed DC magnetron.
4. P. Lukeš, M. Člupek, V. Babický, P. Šunka, G. Winterová, V. Janda: Non-thermal plasma induced decomposition of 2-chlorophenol in water.
5. A. Mackova, V. Perina, V. Hnatowicz, H. Biedermann, D. Slavinska, G. Koshelev, A. Choukorov: Investigation of plasma polymer composite layers by RBS and ERDA analytical methods.
6. M. Mesko, P.Vašina, A.Tálský, Z.Frgala, V.Kudrle and J.Janča: Interferometer diagnostic of nitrogen microwave pulse discharge.
7. M. Mesko: Elementary processes and chemical reactions in low temperature plasma.
8. Valeri N. Pimenov, Vladimir A. Gribkov, Alexander V. Doubrovsky, Marek Scholz, Yulo E. Ugaste, Ryszard Miklaszewski: Influence of powerful pulses of hydrogen plasma upon materials.
9. R. Miklaszewski: Plasma focus for material investigations.
10. Young Sun Mok and Moo Hyun Cho: Oxidation of volatile organic compounds by using a microwave-induced plasma process.
11.
J. Müllerová, E.
Pinčík, H. Kobayashi: Optical modelling of reflectance losses
of a-Si:H multi-junction solar cells.
12. Stanislav Novák, Rudolf Hrach: Role of projections and sections in morphological analysis of composite films.
13. Anna Opalska, Teresa Opalińska, Krzysztof Schmidt-Szałowski, Paweł Ochman: Decomposition of chlorodifluoromethane in the gliding arc reactor under oxidizing conditions.
14. A. D. Pajdarová, J. Vlček, P. Bělský, J. Leština and J. Musil: Characterization of pulsed magnetron sputtering plasmas using time-resolved optical emission spectroscopy.
15. Z. Stryhal, J. Pavlík, A. Macková, V. Perina: Surface Characterization of Tin Oxide Thin Films for Gas Sensors Prepared by Plasma Oxidation.
16. B. Pezler, W. Barszczewska, J. Kopyra, J. Wnorowska, I. Szamrej: Electron attachment to halopropanes.
17. E. Pinčík, J. Müllerová, H. Kobayashi, M. Jergel, R. Brunner, and L. Ortega: Interaction of oxygen rf plasma with a-Si:H.
18. E. Pinčík, E. Lomonova, R. Brunner, M. Jergel, C. Falcony, J. Müllerová, M. Hartmanová: Plasma oxidation of YSZ/Si systems.
19. E. Pinčík, R. Brunner, M. Kučera, M. Jergel, L. Ortega: Plasma and ion beam treatment of GaAs.
20. J. Podlinski, M. Kocik, J. Dekowski, J. Mizeraczyk: Velocity field measurements by PIV in non-thermal plasma wire-to-plate reactor.
21. J. Čížek, Š. Potocký, J. Vlček, M. Kormunda, V. Peřina and Z. Soukup: Superhard Si-B-C-N films prepared by reactive magnetron sputtering.
22. S. Rubio, M.C. Quintero, A. Rodero, R. Alvarez: Removal of VOCs by a high pressure microwave plasma torch.
23. R. Alvarez, A. Rodero, M.C. Quintero, S. Rubio: Radial study of atomic and ionic argon species in the helium-argon microwave plasma produced by the axial injection torch.
24. Joanna Ruszniak, Michał Młotek, Krzysztof Krawczyk, Krzysztof Schmidt-Szałowski: Glid-arc reactor for methane processing.
25. M. Scholz: Plasma focus as a source of radiation and plasma streams for technological applications.
26. P. Sťahel: Study of the surface energy of plasma activated non-woven polypropylene textiles.
27. M. Šíra, M. Klíma, P. Janderka, E. Drbálková, and J. Janča: Mass spectrometry of liquids activated by the barrier torch discharge.
28. E. Vašeková, M. Stano, J. D. Skalný, Š. Matejčík: Electron impact ionization of ethane: ionization energies and temperature effects.
29. S. Gurlui, M. Strat, Georgeta Strat and C. Agheorghiesei: The study of the plasma potential of the free double layer using the xoopic software.
30. S. Gurlui, M. Strat, Georgeta Strat and C. Agheorghiesei: The study of the ionic distribution of the free double layer using the xoopic software.
31. M. Tabrizchi and S. Shooshtary: The Effect of Temperature on Corona Discharge in Ion Mobility Spectrometry.
32. B. Ulejczyk: Thin film deposited on plastics by plasma process.
33. R. Viskup, L. Juhab, J. Krása: Influence of irradiation conditions on PTFE ablation induced by Soft x-rays emitted from laser–produced plasma.
34. R. Vladoiu: Diamondlike nanostructured carbon film deposition using thermoionic vacuum arc.
35. J. Wnorowska, J. Kopyra, I. Szamrej, S. A. Pshenichnyuk, N. L. Asfandiarov: Low energy electron interaction with chlorofluoroethanes.
36. M. Zahoran, R. Juráni, E. Pinčík, R. Brunner, M. Jergel, C. Falcony, K. Gmucová, S. Mráz, T. Holúbek: Plasma immersion oxygen ion implantation to amorphous silicon.
37. H. Zeman, J. Musil, J. Kasl, C. Mitterer, P.H. Mayrhofer: Structure, mechanical properties and residual stress of Al-Si-Cu-N films.
38. A. Zahoranová, M. Zahoran, A. Bucek, M. Cernák: Negative corona current pulses in argon and in mixture argon with SF6
39.
Ľ. Černáková, D. Kováčik, M. Šimor, A.
Zahoranová, M. Černák, M. Mazúr, and P. Kúš: Atmospheric-pressure
plasma activation of PP nonwoven textile followed by acrylic acid grafting.